COLiSA.MMP – COMPUTATIONAL LITHOGRAPHY FOR DIRECTED SELF-ASSEMBLY: MATERIALS,MODELS AND PROCESSES



Ref.No: 63202500
Start date: 01.11.2013
End date: 31.10.2016
Approval date: 21.01.2014
Department: CHEMICAL ENGINEERING
Sector: MATERIALS SCIENCE AND ENGINEERING
Financier: FP7-COLLABORATIVE, E.C.
Budget: 320.837,00 €
Public key: ΒΙΥΗ46ΨΖΣ4-Χ1Ι
Scientific Responsible: Prof. THEODOROU
Email: doros@central.ntua.gr
Description: DIRECTED SELF-ASSEMBLY OF BLOCK COPOLYMERS IS ONE OF THE MOST PROMISING TECHNIQUES TO ENABLE THE CONTINUED MINIATURIZATION OF INTEGRATED CIRCUITS.IT COMBINES TOP-DOWN PHOTOLITHOGRAPHY FOR CREATIONOF GUIDING PATTERNS WITH ENGINEERED NEW MATERIALS AND ...
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