Ref.No: 62304600
Start date: 15.11.2012
End date: 03.08.2014
Approval date: 09.11.2012
Department: CHEMICAL ENGINEERING
Sector: PROCESS ANALYSIS AND PLANT DESIGN
Financier: POLYTECHNICAL INSTITUTE OF TOULOUSE
Budget: 9.225,00 €
Scientific Responsible: Prof. BOUDOUVIS
Email: boudouvi@chemeng.ntua.gr
Description: COMPUTATIONAL FLUID DYNAMICS-BASED ANALYSIS OF THE TRANSPORT OF MOMENTUM,HEAT AND MASS IN CHEMICAL VAPOR DEPOSITION PROCESSES USED FOR THE GROWTH OF THIN METALLIC FILMS.OF PARTICULAR INTEREST IS THE EFFECT OF THE TEMPERATURE PROFILE ON WAFER /WALL SURFA
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