CRITICAL SUB-100nm INDUSTRIAL SCALE PATTERNS FOR CMOS-NANO ARCHITECTURES

Ref.No: 61165000
Start date: 01.12.2005
End date: 30.06.2009
Approval date: 08.02.2006
Department: CHEMICAL ENGINEERING
Sector: PROCESS ANALYSIS AND PLANT DESIGN
Financier: ΠΕΝΕΔ 2003, G.G.E.T.
Budget: 10.510,00 €
Scientific Responsible: Prof. BOUDOUVIS
Email: boudouvi@chemeng.ntua.gr
Description: CRITICAL SUB-100nm INDUSTRIAL SCALE PATTERNS FOR CMOS-NANO ARCHITECTURES
Go to Top