SCHOLASTIC SIMULATION,SYSTEMIC ANALYSIS AND EXPERIMENTAL INVESTIGATION OF CHEMICAL VAPOR DEPOSITION PROCESSES.APPLICATION TO THE DEVELOPMENT OF THIN FILMS OF CONDUCTIVE METAL OXIDES

Ref.No: 68081700
Start date: 01.03.2004
End date: 31.12.2007
Approval date: 27.09.2004
Department: CHEMICAL ENGINEERING
Sector: PROCESS ANALYSIS AND PLANT DESIGN
Financier: ΕΠΕΑΕΚ II, U.P.E.P.TH
Budget: 80.000,00 €
Scientific Responsible: Prof. BOUDOUVIS
Email: boudouvi@chemeng.ntua.gr
Description: THE OBJECTIVE OF THIS PROJECT IS THE ANALYSIS OF THE PERFORMANCE OF CHEMICAL VAPOR DEPOSITION REACTORS, WHICH ARE EXTENSIVELY USED IN MICROELECTRONICS FOR THE MANUFACTURING OF THIN SOLID FILMS. THE REACTANTS ENTER THE REACTOR IN THE GAS PHASE,ARE.......
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